The working principle of an EPI scrubber

Scrubbers for epitaxial applications are devices used o reduce the concentration of substances present in the reactor outlet gases during the epitaxial deposition process: a process used for the production of semiconductor devices such as transistors and diodes.
The scrubber, using a reactive chemical liquid, usually an acidic or basic aqueous solution, removes the harmful gases produced during the epitaxial deposition process.
The gas leaving the reactor is introduced into the scrubber together with the reactive liquid. This creates a nebulised mixture, within which the gases react chemically with the liquid, forming less harmful reaction products.
The contaminated liquid is then collected and disposed with a safe and low environmental impact procedures.
The design and construction of an epitaxial scrubber depends on the specifics of the epitaxial deposition process used and local environmental regulations.
Scrubbers for epitaxial applications are designed to be highly efficient in removing the exhaust gases produced, minimizing environmental impact and ensuring the safety of operators working nearby.

What are EPI scrubbers

Epitaxial scrubbers are used in the semiconductor manufacturing industry to remove contaminants from gases produced during the epitaxial deposition process of silicon wafers.
Epitaxy is a technique used for the deposition of thin layers of semiconductors and scrubbers are used to remove harmful substances produced during this process, which could be dispersed into the atmosphere.